Ion-plasma, electron beam and thermal deposition

SEO-TEC MS Magnetron Sputtering Vacuum System

The SEO-TEC MS magnetron sputtering vacuum system is designed for small and medium-scale production and research work in the field of thin film deposition using magnetron sputtering at a rate of 1…2 µm/h (compounds) to 8…12 µm/h (pure metals) with non-uniformity of the applied coating not exceeding 1.5%..

The system provides sputtering of thin films from chemically pure Al, Cu, Ti, Cr, Si, Au, In, and other metals and semiconductors, as well as their oxides and nitrides (with the appropriate selection of process modes).

Field of application: vacuum deposition laboratories of research and production enterprises.

Main Technical Specifications:
1	Electrical input parameters of the system:
	type of current nominal voltage, V nominal current frequency, Hz power consumption, kVA, max power quality standards	3-phase AC; 380; 50; 35; DSTU EN 50160-2014
2	Operating conditions:	UKHL 4.2 according to GOST 15150-69 in regions with a temperate climate, in enclosed spaces:
	permissible indoor temperature, °C maximum relative humidity, % at 25°C atmospheric pressure, mmHg	15…28; 65; 710…780
3	Cooling:
	cooling water temperature, °C flow rate, l/h	20…25; 25;
4	Weight of the system, kg, max	420
5	Overall dimensions:
	vacuum chamber (L×W×H), mm vacuum pumping station (L×W×H), mm process rack (L×W×H), mm control system rack (L×W×H), mm	470×470×350; 550×550×600; 600×700×1600; 800×600×1600.
6	Vacuum system with oil-free pumps with corresponding pumping capacity:
	Scroll series primary pump, capacity l/s high-vacuum turbomolecular pump, capacity l/s pumping high-vacuum flange equipped with a pneumatically driven gate valve ultimate vacuum, Torr time to reach operating vacuum, min, max pneumatically driven vacuum fittings, operating pressure, atm	17; 1300; available; 5×10^-6; 12; 5…7.
7	Sputtering system:
	• type of main magnetron • number of magnetrons, pcs. • ion source • working gas • controlled process gas inlet system • maximum flow rate, l/min	planar, unbalanced, hot target; 3; multi-cell (not less than 16 ion beams); argon, GOST 10157-79; 3-channel: argon, air, freon); 6.
8	Control system with functions:	computerized:
	manual and automatic mode of vacuum system operation; display of the mimic diagram with sensor readings on the monitor screen;
9	Continuous operation time, h, min	8.
10	Warranty period, years, min (from the date of commissioning at the Customer's site)	1.5.
11	Total average service life of the system, years	12.
Scope of delivery includes:
	SEO-TEC MS magnetron sputtering vacuum system consisting of:	1 pc.
1	Process rack consisting of:
	- power supply rack; - water distribution system; - vacuum chamber; - butterfly valve; - vacuum pumps; - pneumatic valves of the vacuum system; - gas inlet system; - vacuum sensors	1 pc. 1 pc. 1 pc. 1 pc. 1+1 pcs. 1 pc. 1 pc. 1+1 pcs.
2	Vacuum pumping station	1 pc.
3	Air compressor	1 pc.
4	Stationary cooling system	1 pc.
5	Control system rack	1 pc.
6	Cable set	1 set
7	Software + backup copy	1 set
8	Data sheet with warranty card	1 pc.
9	Operating manual	1 pc.

The SEO-TEC MS magnetron sputtering vacuum system complies with current technical documentation and mandatory requirements of state standards: GOST 12.2.003-91 "SSBT. Industrial equipment. General safety requirements"; DSTU 7234:2011 "Design and ergonomics. Industrial equipment. General requirements of design and ergonomics".

Equipment and technologies for electron-beam and ion-plasma treatment of materials

The production and commercial company Sumy Electron Optics (SEO) works in the field of creating research equipment and vacuum technology for various fields of science and technology.

Using the modern equipment, new technologies and proprietary software products, the SEO firm carries out the following activities:

Using the modern equipment, new technologies and proprietary software products, the SEO firm carries out the following activities:
Designing and manufacturing of vacuum ion-plasma coating plants by various methods: electron beam (EB-PVD), arc-arc (Arc-PVD), magnetron sputtering (MS), ion beam (IBAD according to customer's specification).
Designing and manufacturing of vacuum installations for ion-plasma nitriding of machine parts. Modernization of industrial installations НШВ-28.7 / 6-И1, НШВ-9.18 / 6-И2, etc.
Design and manufacture of vacuum installations for the application of optical coatings (antireflection, interference, etc.).
Modernization of vacuum ion-plasma equipment (electric arc and magnetron sputtering plants) - Bulat-6, Bulat-3, NNV-6.6, MAP-1, VU-2M, VU-2MBS, etc.
Manufacture of units for vacuum ion-plasma deposition plants (cathode nodes, magnetrons, ion sources, gas leakage, etc.)

Vacuum installations of ion-plasma coating provide the application of functional wear, heat, erosion, cavitation and corrosion-resistant coatings on machine parts, application of nanostructured wear-resistant coatings on the tool: cutters, drills, including small ones (∅up to 1 mm), punches, dies, plungers and the like.

The manufactured vacuum equipment is designed and manufactured in full compliance with modern requirements for industrial vacuum installations. This is a modern element base and the most complete realization of technological capabilities of equipment due to automation of the process technology.

The ability to adapt to customer requirements is an important virtue of our company. We are ready to offer solutions that exactly match the customer's specifications, including unique engineering developments.

Almost any solution for the formation of thin films and coatings can be integrated into our equipment, while we can use the best components from market leaders, be they automation devices or vacuum components. The choice of equipment - for the customer.

All vacuum units are equipped with an automated process control system (ASUTP), which has undergone many years of industrial testing in the conditions of various serial productions. This allows us to solve typical tasks of the automated process control system - process technology for a given program, equipment diagnostics, emergency situations, creation and archiving of working protocols, and also to work in "manual mode".

The application of this system ensures the stability and repeatability of the properties and characteristics of the sprayed coatings and nitrided products from batch to batch meeting the current world level.

Especially it should be noted that we ourselves are developing software for our installations. If the majority of competitors order software on the side, which slows down its debugging and refinement and raises the cost, then we always equip the equipment with optimal software reliability and functionality.

In the case of equipment modernization, we perform not just a restoration, but a deep modernization of the spraying plants. Obsolete and exhausted components are replaced, including electronics, electrical equipment, separate technological modules. From the old installation, in fact, only the frame remains.

The equipment is equipped with modern software, and in terms of its capabilities, it is almost as good as new models of the same class, while the savings for the customer are very significant: the cost of the restored equipment can be 2 to 3 times lower than the new one with comparable characteristics. Restored plants are guaranteed.

The delivery of the equipment may include services for training the Customer's personnel and technological support of the equipment.

Below in the appendix the information illustrating some developments of installations of ion-plasma and electron-beam spraying is given.

Vacuum station SEO-EB TEC

The device is intended for coating optical surfaces by the method of resistive and electron-beam evaporation of dielectrics, semiconductors and metals with simultaneous control of coating thickness.

The station provides the possibility of applying multi-layer achromatic coatings on optical parts, as well as metallic, single-layer antireflective, interference mirror, filter and others for different spectral regions.

The station consists of: a working chamber, a pumping station based on TMP, a forvacuum unit, electrical equipment for power supply and control of the vacuum system and technological systems.

Specification
1	Pressure in the chamber, mmHg.	5×10^-6
2	Time to reach vacuum, min, not more than	20
3	Temperature of heating in the chamber, °С	100 - 320
4	Number of resistive evaporators, pcs.	2
5	Number of electron-beam evaporators, pcs.	1
6	Number of holders of substrates, pcs.	4
7	Maximum size of substrates, mm	50 × 50
8	Plasma cleaning voltage, kV	2
9	Current of resistive evaporators, A, at 24 V	150
10	Current of electron-beam evaporator, mA, at 10 kV	500
11	Power consumed of station, kW	20
12	Control system	From industrial computer

Vacuum installation series SEO-TES MS

Vacuum installation for deposition of multifunctional nanocomposite coatings from Zr, Ti, Cr alloys by the method of reactive deposition with magnetron spreading in the DC / PULSE mode

The SEO-TES MS installation is designed to apply protective and functional coatings of 10-25 microns thick from multicomponent materials, including special alloys or nanocrystalline composites, as well as metallic, oxide, nitride, carbide and other types of coatings for products of various purposes made of steels and titanium alloys, in particular GTE blades

Software with functions:

automatic pumping mode;
manual pumping mode;
display the mnemonic scheme of operation and all parameters of the control system of the installation on the monitor screen;
programming of spraying modes and their reproduction;
blocking the operation of the installation in the event of an emergency and the incorrect operation of the installation systems.

Specification
1	Supply network:	380V / 50Hz (60Hz)
2	Power consumption, kVA, no more than	60
3	Cooling	closed water, stationary
4	Installation weight, kg, no more than	2000
5	Dimensions: (length, width, height), mm, not more	2800 × 3500 × 2100
6	Time to reach working vacuum, min, not more than	20
7	Spraying system	magnetron
7.1	Type of magnetron:	with hot target; unbalanced; balanced;
8	Ionic source:	multicellular
	- working gas - the length of cleaning parts, mm - source installation	argon 200 external
9	Power supply system
9.1	Magnetron power supply system:
	- maximum power consumption of 1 channel, kW - input voltage, V - output current, A - mode of operation - frequency, kHz	13,6 65 - 650 0,1 - 18,5 DC, PULSE 1 - 100
9.2	Ion Source Power Supply:
	- supply network: - maximum output power, kW - maximum output current, A	three-phase 2 1,0
10	Gas filling system	3 independent channels(H₂; C₂H₂; Ar)
11	Carousel:	planetary type
	- the speed of rotation of the carousel around its axis, 1/min - speed of rotation of satellites around its axis, 1/min - number of mechanisms for fixing parts, шт.	0 - 10 0 - 10 16
12	Power supply of bias potential:
	- output power, kW - output voltage, V - mode of operation	0,1 - 6,0 10 - 300 DC, PULSE
13	Heater	resistive
	- product heating temperature, up to °C	500
14	Controlled protective screens	for magnetron sprays
15	Control computer	candybar with touch 17″ monitor
	- operating system	Windows 7/32
16	Software	SEO ТЕСН Control (Copyright registration № 27337)

Installation of the SEO-EBPVD TEC series for the application of ceramic coatings

Electron Beam Unit SEO-EBPVD TES is designed to apply ceramic layers of heat-shielding coatings (HCS) to protect against high-temperature gas corrosion of turbine rotor blades from stabilized zirconia.

Such coatings allow increasing blade life by 3-5 times. Scope of application: laboratory and production areas of ion-plasma and gas-thermal coatings.

The installation includes:

Water cooled chamber composed of:

loading module with sample movement mechanism
heating module with a resistive type heater (can be heated by a gun) and a temperature monitoring system
a sputtering module with a rotating mechanism for specimens, a crucible, and a supply mechanism for the evaporated stick

Vacuum system based on a diffusion vapor-oil pump
Electron Beam Cannon
Stroboscopic viewing window
Control cabinet with high-voltage gun power source
Cooling system of the chamber, crucible and gun
Pneumatic system for operation of the drive for supply of samples and elements of the vacuum system
Gas supply system

The control program provides:

automatic and manual control of the vacuum system;
display the mimic diagram of the vacuum system on the monitor screen;
programming and playback of spraying modes;
control of accident-free operation of the plant

Specifications
1	Supply Network	380 V, 50/60 Hz , three-phase
2	Power consumption, kV A, no more than	35
3	Cooling installations	stationary cooling station
4	Installation weight, kg, no more than	11000
5	Overall dimensions of the installation (length, width, height), mm	4000 × 2000 × 2000
6	Vacuum system	Two-stage on the basis of the diffusion steam-oil pump
7	Working pressure in the sputtering module, Torr mmH, not more than:	1×10³ - 1×10⁴
8	The preheating temperature of the articles, °С	950±50
9	Gas filling system	2 channels (O₂, Аг)
10	The crucible for evaporation	water-cooled 40mm
11	Movement of the column in the crucible along the vertical axis, mm	from 150
12	Visualization and observation of the evaporation process	stroboscopic sight glass
13	Electron Beam Cannon	cold-cathode discharge
	- electron beam power, kW - accelerating stress, kV - electron beam scanning frequency, Hz, not more than - sweep shape	from 20 from 20 100 spiral concentric
14	Installation Management System	computer
15	Software	SEO ТЕСН Control (Copyright registration № 27337)

Vacuum installation series SEO-TES ArcPVD / MS ion-plasma spraying

The vacuum installation of the SEO-TEC ArcPVD / MS series is designed to apply protective and functional coatings of 0.5-50 μm thickness from multicomponent materials, including special alloys or nanocrystalline composites, as well as metallic, oxide, nitride, carbide, carbonitride, oxycarbide and other types of coatings using dual magnetron and arc evaporators.

SCOPE OF APPLICATION: vacuum evaporation laboratories for research and production enterprises.

The installation includes:

Technological rack:

power rack;
water distribution system;
the vacuum chamber;
ion cleaning unit;
dual magnetrons;
dual arc evaporators;
heater;
carousel;
disk shutter;
turbomolecular pump;
pneumatic flaps of the foreline;
vacuum sensors;
gas inlet system.

Control system stand
Vacuum Pumping Station
Pneumatic system

The control program provides:

automatic and manual control of the vacuum system;
display the mimic diagram of the vacuum system on the monitor screen;
display of the sensors on the monitor screen;
display controls on the monitor screen;
independent control of evaporator currents;
independent control Open / close evaporator screens;
independent control of the heater temperature;
independent change of temperature (heater)
programming and playback of spraying modes;
blocking the operation of the installation in emergency situations.

Specifications
1	Supply network:	380V/50Hz three-phase
2	Power consumption, kVA, no more than	25
3	Installation weight, kg, no more than	648
4	Dimensions: (length, width, height), mm, not more	2000 × 2000 × 1800
5	Time to reach working vacuum, min, not more than	20
6	Spraying systems:
	6.1 Magnetron: number of magnetrons magnetron type mode of operation of magnetrons diameter / thickness of cathode, mm	2 dual balanced / unbalanced DC/PULSE 95/8,5
	6.2 Vacuum-arc: number of nozzles	2 dual
7	Ion source:	Multicell (22 ion beams)
	working area, mm	400
8	Power supply systems:
	8.1 Magnetron power supply system: output power of 1 channel, max, kW output voltage, V output current, A mode of operation frequency, kHz amplitude of arson, V	10 70 - 700 0,1 - 16 DC, PULSE 1 - 100 1000
	8.2 Arc Power Evaporator Power Supply System: output current of 1 channel, А output voltage, V no-load voltage, V adjustment	4 inverter units 90 - 150 90 100 current
	8.3 Power supplies ion source: maximum output power, kW< output voltage, V maximum output current, A	2 400 - 5000 1,5
9	Gas filling system	3 channels
	gas supply in channels controlled level of leakage, Torr*l/s the maximum throughput, l/min	independent 10 6
10	Carousel:	planetary type
	diameter of carousel, mm speed of rotation around the central axis of the carousel, 1/min number of mechanisms of fastening parts	180 1 - 10 6
11	Power supply of bias potential:
	voltage adjustment range, V maximum current, A	10 - 1000 7
12	Heater:	resistive
	maximum heating temperature, °C	560
13	Managed protective screens for:	magnetron sprays arc diffusers ion source
14	Control computer:	Candybar Advantech with 17″ monitor
15	Software	SEO ТЕСН Control (Copyright registration № 27337)